Product Name: Ultra-thin and Super-large Aluminum Nitride Ceramic Ring
Product Material: High-purity Aluminum Nitride Ceramic (AlN ≥99.5%)
Material Characteristics:
Ultra-high thermal conductivity (180-200 W/m·K), excellent electrical insulation, low thermal expansion coefficient (4.5×10⁻⁶/°C), high temperature resistance (up to 1800°C), excellent plasma erosion resistance, high mechanical strength, non-toxic and environmentally friendly
Application Fields:
Semiconductor manufacturing, plasma etching equipment, chemical vapor deposition systems, high-power electronic devices
Application Industries:
Wafer processing equipment, LED manufacturing, power module packaging, 5G communication devices
Processing Difficulties:
Large diameter-to-thickness ratio (>50:1) processing, warpage control during sintering, ultra-thin wall machining (thickness <1mm), surface roughness control (Ra ≤0.4μm), dimensional accuracy maintenance
Processing Flow:
Powder preparation → slurry process → tape casting → isostatic pressing → high-temperature sintering → CNC precision machining → laser measurement → ultrasonic cleaning → vacuum packaging
Delivery Period:
35-45 days
This ultra-thin and super-large aluminum nitride ceramic ring represents the pinnacle of advanced ceramic manufacturing technology. Specifically engineered for the most demanding semiconductor and electronic applications, it combines exceptional thermal management capabilities with outstanding electrical insulation properties. The large-size design with ultra-thin walls makes it ideal for applications requiring both thermal performance and space efficiency in high-temperature, high-frequency environments.
Key Features:
Exceptional Thermal Management - Ultra-high thermal conductivity (180-200 W/m·K) enables efficient heat dissipation in high-power applications
Perfect Electrical Insulation - High dielectric strength (≥15 kV/mm) ensures reliable performance in high-voltage environments
Superior Thermal Stability - Withstands thermal cycling from room temperature to 1800°C without performance degradation
Excellent Plasma Resistance - Maintains structural integrity in corrosive plasma environments
Precision Dimensional Control - Advanced manufacturing process ensures tight tolerances (±0.1mm) and excellent surface quality
